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 The
other interest of our group lies in the fabrication of designed 2D
patterned surfaces for its applications to microelectronic, optoelectronic
and magnetic recording devices, and biochips/sensors. The methods
of fabrication include soft-lithography such as microcontact printing,
replica molding, and nanoimprinting, as well as advanced lithographic
techniques such as E-beam, X-ray, and ion beam lithography. Although
these lithographic techniques based on 'top-down approach' are very
useful in the pattern fabrication for submicron-scale patterns, they
are limited in cost and processing time. Self-assembly 'bottom-up'
approaches are alternative methods in the simple control of the pattern
size and low-cost parallel processes. Recently, cost-effective hybrid
fabrication processes have been developed to fabricate designed patterns
using soft lithography in combination with the self-assembly of colloidal
nanospheres, block copolymers, and surfactants.
In particular, thin films of self-organized nanosphere array or block
copolymers have considerable attention because of their potential
application as templates or masks for the nanolithographic fabrication
of magnetic and electronic media materials and devices. In our group,
ordered nanopatterns with the feature-size in the range of 15-100
nm have been successfully organized by using nanosphere and block
copolymer lithographic fabrications. The self-assembled nanopatterns
that are transferred onto silicon wafer substrate can be modified
simply by the reactive ion etching (RIE) or ion milling. For the memory
device applications, spintronic substances are impregnated into the
patterned substrate as isolated nanoscopic domains. In addition, the
self-assembly route of nanopattern formation has a number of applications
including DNA chip, storage memory device, low-k materials, and advanced
nano-lithography.
Applications
 Spintronic host for terabit information storage devices
Host materials for synthesis of quantum dots
Our collaboration groups
OOEM
in KAIST
Spintronics group in KAIST
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Research
Overview
